Communication

Optical Lithography with Printed Metal Mask and a Simple Superhydrophobic Surface†

  1. Tae-il Kim1,
  2. Chang hoon Baek1,
  3. Kahp Y. Suh Prof.2,
  4. Soon-min Seo Prof.3,
  5. Hong H. Lee Prof.1

Article first published online: 17 JAN 2008

DOI: 10.1002/smll.200700882

Issue

Small

Small

Volume 4, Issue 2, pages 182–185, February 1, 2008

Additional Information

How to Cite

Kim, T.-i., Baek, C. h., Suh, Kahp Y., Seo, S.-m. and Lee, Hong H. (2008), Optical Lithography with Printed Metal Mask and a Simple Superhydrophobic Surface. Small, 4: 182–185. doi: 10.1002/smll.200700882

Author Information

  1. 1

    School of Chemical and Biological Engineering, Seoul National University, Seoul, 151-742, Korea, Fax: (+82) 287-850-43

  2. 2

    School of Mechanical and Aerospace Engineering, Seoul National University, Seoul, 151-742, Korea

  3. 3

    Gachon BioNano Research Institute, Kyungwon University, Gyeonggi, 461-701, Korea

  1. †

    This work is supported by KOSEF [R01-2006-000-10140-0(2006)].

Publication History

  1. Issue published online: 4 FEB 2008
  2. Article first published online: 17 JAN 2008
  3. Manuscript Received: 29 SEP 2007

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Keywords:

  • nanolenses;
  • nanolithography;
  • nanostructures;
  • printing;
  • superhydrophobicity
Thumbnail image of graphical abstract

A nanolithographic optical patterning technique is presented. A metal pattern on a mold is transferred onto a photoresist on a substrate, then the resist with the printed metal mask is flood illuminated. The light passes through only the resist lenses that are formed in the transfer process. Focusing by these lenses results in a significant reduction in the feature size.

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