This work is supported by KOSEF [R01-2006-000-10140-0(2006)].
Optical Lithography with Printed Metal Mask and a Simple Superhydrophobic Surface†
Article first published online: 17 JAN 2008
Copyright © 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 4, Issue 2, pages 182–185, February 1, 2008
How to Cite
Kim, T.-i., Baek, C. h., Suh, Kahp Y., Seo, S.-m. and Lee, Hong H. (2008), Optical Lithography with Printed Metal Mask and a Simple Superhydrophobic Surface. Small, 4: 182–185. doi: 10.1002/smll.200700882
- Issue published online: 4 FEB 2008
- Article first published online: 17 JAN 2008
- Manuscript Received: 29 SEP 2007
A nanolithographic optical patterning technique is presented. A metal pattern on a mold is transferred onto a photoresist on a substrate, then the resist with the printed metal mask is flood illuminated. The light passes through only the resist lenses that are formed in the transfer process. Focusing by these lenses results in a significant reduction in the feature size.