These authors contributed equally.
Polyethylene Glycol as a Novel Resist and Sacrificial Material for Generating Positive and Negative Nanostructures†
Article first published online: 18 JUN 2008
Copyright © 2008 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 4, Issue 7, pages 920–924, July 2008
How to Cite
Sanedrin, R. G., Huang, L., Jang, J.-W., Kakkassery, J. and Mirkin, C. A. (2008), Polyethylene Glycol as a Novel Resist and Sacrificial Material for Generating Positive and Negative Nanostructures. Small, 4: 920–924. doi: 10.1002/smll.200701089
C. A. M. acknowledges DARPA, AFSOR, NSF, NSEC, and NCI (through the CCNE program) for support of the research. He is also grateful for a NIH Director's Pioneer Award.
- Issue published online: 11 JUL 2008
- Article first published online: 18 JUN 2008
- Manuscript Revised: 24 JAN 2008
- Manuscript Received: 9 NOV 2007
- dip-pen nanolithography;
- polyethylene glycol;
- wet chemical etching