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Keywords:

  • dip-pen nanolithography;
  • nanostructures;
  • polyethylene glycol;
  • resists;
  • wet chemical etching
Thumbnail image of graphical abstract

One material for two purposes: Poly(ethylene glycol) is used as a novel etch resist to generate both raised and recessed nanoscale solid-state structures (see image). This novel resist is inexpensive, easy to use, and affords sub-100-nm resolution.