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Matrix-Assisted Dip-Pen Nanolithography and Polymer Pen Lithography

Authors

  • Ling Huang,

    1. School of Chemical and Biomedical Engineering Nanyang Technological University 70 Nanyang Drive, Singapore 637457 (Singapore)
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  • Adam B. Braunschweig,

    1. Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)
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  • Wooyoung Shim,

    1. Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)
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  • Lidong Qin,

    1. Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)
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  • Jong Kuk Lim,

    1. Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)
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  • Sarah J. Hurst,

    1. Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)
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  • Fengwei Huo,

    1. Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)
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  • Can Xue,

    1. Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)
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  • Jae-Won Jang,

    1. Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)
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  • Chad A. Mirkin

    Corresponding author
    1. Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)
    • Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)
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  • L. H., A. B. B., and W. S. contributed equally to this work. C.A.M. acknowledges AFOSR and DARPA-SPAWAR for support of this work. A.B.B. is grateful for an NIH Postdoctoral Fellowship (5F32CA13648-02).

Abstract

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The controlled patterning of nanomaterials presents a major challenge to the field of nanolithography because of differences in size, shape, and solubility of these materials. Matrix-assisted dip-pen nanolithography and polymer-pen lithography provide a solution to this problem by utilizing a polymeric matrix that encapsulates the nanomaterials and delivers them to surfaces with precise control of feature size (see image).

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