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Nanogap Electrode Fabrication for a Nanoscale Device by Volume-Expanding Electrochemical Synthesis

Authors

  • Ju-Hyun Kim,

    1. Nano-Oriented Bio-Electronic Lab (NOBEL), Department of Electrical Engineering, KAIST, 291 Daehak-ro, Yuseong-gu, Daejeon, 305–701, Republic of Korea
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  • Hanul Moon,

    1. Integrated Organic Electronics Lab (IOEL), Department of Electrical Engineering, KAIST, 291 Daehak-ro, Yuseong-gu, Daejeon, 305–701, Republic of Korea
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  • Seunghyup Yoo,

    1. Integrated Organic Electronics Lab (IOEL), Department of Electrical Engineering, KAIST, 291 Daehak-ro, Yuseong-gu, Daejeon, 305–701, Republic of Korea
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  • Yang-Kyu Choi

    Corresponding author
    1. Nano-Oriented Bio-Electronic Lab (NOBEL), Department of Electrical Engineering, KAIST, 291 Daehak-ro, Yuseong-gu, Daejeon, 305–701, Republic of Korea
    • Nano-Oriented Bio-Electronic Lab (NOBEL), Department of Electrical Engineering, KAIST, 291 Daehak-ro, Yuseong-gu, Daejeon, 305–701, Republic of Korea.
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Abstract

A novel nanogap fabrication method using an electrochemical nanopatterning technique is presented. Electrochemical deposition of platinum ions reduces the microgap size to the sub-50-nm range due to the self-limited volume expansion of the electrodes. Additionally, the low crystallinity of platinum reduces the line edge roughness in the electrodes, whereas the high crystallinity of gold increases it. Current compliance, a buffered resistor, and a symmetric deposition strategy are used to achieve high reliability and practicality of nanogap electrodes. As a possible application, an organic thin-film transistor using the nanogap electrodes is also demonstrated.

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