3D Nanofluidic Channels Shaped by Electron-Beam-Induced Etching

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Abstract

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In-plane nanofluidic channels with 3D topography are fabricated. Nanochannel masters are written by electron beam lithography in SU-8 resist and shaped by electron-beam-induced etching (EBIE) with water as the precursor gas. Nanofunnel replicas cast from unmodified and EBIE-modified masters show that the funnel tip dimensions decrease from a 150-nm depth and 80-nm width to a 70-nm depth and 40-nm width.

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