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Directed Self-Assembly with Sub-100 Degrees Celsius Processing Temperature, Sub-10 Nanometer Resolution, and Sub-1 Minute Assembly Time

Authors

  • Woon Ik Park,

    1. Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 305-701, Republic of Korea
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  • Kyungho Kim,

    1. Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 305-701, Republic of Korea
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  • Hyun-Ik Jang,

    1. Division of Nano-Convergence Technology, Korea National NanoFab Center, Deajeon 305-806, Republic of Korea
    2. Department of Materials Science and Engineering, University of Seoul, Seoul 130-743, Republic of Korea
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  • Jae Won Jeong,

    1. Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 305-701, Republic of Korea
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  • Jong Min Kim,

    1. Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 305-701, Republic of Korea
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  • Jaesuk Choi,

    1. Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 305-701, Republic of Korea
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  • Jae Hong Park,

    1. Division of Nano-Convergence Technology, Korea National NanoFab Center, Deajeon 305-806, Republic of Korea
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  • Yeon Sik Jung

    Corresponding author
    1. Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 305-701, Republic of Korea
    • Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 305-701, Republic of Korea.
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Abstract

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The synergetic combination of low-temperature thermal assistance with solvent annealing for the self-assembly of block copolymers with a large Flory-Huggins interaction parameter simultaneously achieves sub-10 nm resolution and sub-1 minute annealing time. It is shown that this method is applicable to different geometries of patterns such as nanoscale dots, lines, and holes.

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