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Communication

Pitch-Tunable Size Reduction Patterning with a Temperature-Memory Polymer

  1. Won-Gyu Bae1,2,
  2. Jae Hoon Choi1,
  3. Kahp Y. Suh1,2,*

Article first published online: 21 SEP 2012

DOI: 10.1002/smll.201201554

Issue

Small

Small

Volume 9, Issue 2, pages 193–198, January 28, 2013

Additional Information

How to Cite

Bae, W.-G., Choi, J. H. and Suh, K. Y. (2013), Pitch-Tunable Size Reduction Patterning with a Temperature-Memory Polymer. Small, 9: 193–198. doi: 10.1002/smll.201201554

Author Information

  1. 1

    Department of Mechanical and Aerospace Engineering, Seoul National University, Seoul 151-742, Korea

  2. 2

    Interdisciplinary Program of Bioengineering, Seoul National University, Seoul, 151-742, Korea

*Department of Mechanical and Aerospace Engineering, Seoul National University, Seoul 151-742, Korea.

Publication History

  1. Issue published online: 21 JAN 2013
  2. Article first published online: 21 SEP 2012
  3. Manuscript Revised: 27 JUL 2012
  4. Manuscript Received: 4 JUL 2012

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Keywords:

  • temperature memory effects;
  • shape memory polymers;
  • nanoimprint lithography;
  • pitch reduction;
  • patterning
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A scalable and pitch-tunable size reduction patterning method is introduced by exploiting the temperature memory effect of shape memory polymer and replica molding of UV-curable materials.

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