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Pitch-Tunable Size Reduction Patterning with a Temperature-Memory Polymer

Authors

  • Won-Gyu Bae,

    1. Department of Mechanical and Aerospace Engineering, Seoul National University, Seoul 151-742, Korea
    2. Interdisciplinary Program of Bioengineering, Seoul National University, Seoul, 151-742, Korea
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  • Jae Hoon Choi,

    1. Department of Mechanical and Aerospace Engineering, Seoul National University, Seoul 151-742, Korea
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  • Kahp Y. Suh

    Corresponding author
    1. Department of Mechanical and Aerospace Engineering, Seoul National University, Seoul 151-742, Korea
    2. Interdisciplinary Program of Bioengineering, Seoul National University, Seoul, 151-742, Korea
    • Department of Mechanical and Aerospace Engineering, Seoul National University, Seoul 151-742, Korea.
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Abstract

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A scalable and pitch-tunable size reduction patterning method is introduced by exploiting the temperature memory effect of shape memory polymer and replica molding of UV-curable materials.

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