Facile and Clean Release of Vertical Si Nanowires by Wet Chemical Etching Based on Alkali Hydroxides
Article first published online: 23 NOV 2012
Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 9, Issue 6, pages 905–912, March 25, 2013
How to Cite
Yoon, S.-S. and Khang, D.-Y. (2013), Facile and Clean Release of Vertical Si Nanowires by Wet Chemical Etching Based on Alkali Hydroxides. Small, 9: 905–912. doi: 10.1002/smll.201201804
- Issue published online: 15 MAR 2013
- Article first published online: 23 NOV 2012
- Manuscript Revised: 28 SEP 2012
- Manuscript Received: 26 JUL 2012
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