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Communication

Large Area Resist-Free Soft Lithographic Patterning of Graphene

  1. Antony George1,
  2. S. Mathew3,
  3. Raoul van Gastel2,*,
  4. Maarten Nijland1,
  5. K. Gopinadhan3,
  6. Peter Brinks1,
  7. T. Venkatesan3,
  8. Johan E. ten Elshof1,*

Article first published online: 19 NOV 2012

DOI: 10.1002/smll.201201889

Issue

Small

Small

Volume 9, Issue 5, pages 711–715, March 11, 2013

Additional Information

How to Cite

George, A., Mathew, S., van Gastel, R., Nijland, M., Gopinadhan, K., Brinks, P., Venkatesan, T. and ten Elshof, J. E. (2013), Large Area Resist-Free Soft Lithographic Patterning of Graphene. Small, 9: 711–715. doi: 10.1002/smll.201201889

Author Information

  1. 1

    Inorganic Materials Science, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands

  2. 2

    Physics of Interfaces and Nanomaterials, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands

  3. 3

    NUSNNI NanoCore, Department of Electrical and Computer Engineering, National University of Singapore, 117576, Singapore

*Physics of Interfaces and Nanomaterials, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands.

Publication History

  1. Issue published online: 4 MAR 2013
  2. Article first published online: 19 NOV 2012
  3. Manuscript Revised: 23 OCT 2012
  4. Manuscript Received: 3 AUG 2012

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Keywords:

  • soft lithography;
  • graphene;
  • patterning;
  • plasma etching;
  • resist-free patterning
Thumbnail image of graphical abstract

Large area low-cost patterning is a challenging problem in graphene research. A resist-free, single-step, large area and cost effective soft lithographic patterning strategy is presented for graphene. The technique is applicable on any arbitrary substrate that needs to be covered with a graphene film and provides a viable route to large-area patterning of graphene for device applications.

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