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Keywords:

  • soft lithography;
  • graphene;
  • patterning;
  • plasma etching;
  • resist-free patterning
Thumbnail image of graphical abstract

Large area low-cost patterning is a challenging problem in graphene research. A resist-free, single-step, large area and cost effective soft lithographic patterning strategy is presented for graphene. The technique is applicable on any arbitrary substrate that needs to be covered with a graphene film and provides a viable route to large-area patterning of graphene for device applications.