Large Area Resist-Free Soft Lithographic Patterning of Graphene
Article first published online: 19 NOV 2012
Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 9, Issue 5, pages 711–715, March 11, 2013
How to Cite
George, A., Mathew, S., van Gastel, R., Nijland, M., Gopinadhan, K., Brinks, P., Venkatesan, T. and ten Elshof, J. E. (2013), Large Area Resist-Free Soft Lithographic Patterning of Graphene. Small, 9: 711–715. doi: 10.1002/smll.201201889
- Issue published online: 4 MAR 2013
- Article first published online: 19 NOV 2012
- Manuscript Revised: 23 OCT 2012
- Manuscript Received: 3 AUG 2012
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