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Direct Fabrication of Hexagonally Ordered Ridged Nanoarchitectures via Dual Interference Lithography for Efficient Sensing Applications

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Abstract

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Novel, large-area uniform hexagonally-ordered ridged nanoarchitectures (HORNs) can be fabricated using dual interference lithography derived from a novel prism and substrate beneath a spin-coated photoresist (PR) film. The metallic HORN arrays provide tunable SERS effects with large-scale sample homogeneity that depends on the number of stacks present along the z-direction, which is determined by the PR film thickness. Furthermore, the HORN structures show significant potential for use in particle-based or fluorescence-based sensing platforms by forming a free suspension of ridged nanoparticles or achieving highly intensified fluorescence signals, respectively.

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