Self-Assembly: Sacrificial-Post Templating Method for Block Copolymer Self-Assembly (Small 3/2014)

Authors

  • Amir Tavakkoli K. G.,

    1. Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, MA, USA
    2. NUS Graduate School for Integrative Sciences & Engineering (NGS), Singapore
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  • Samuel M. Nicaise,

    1. Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, MA, USA
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  • Adam F. Hannon,

    1. Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA
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  • Kevin W. Gotrik,

    1. Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA
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  • Alfredo Alexander-Katz,

    1. Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA
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  • Caroline A. Ross,

    1. Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA
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  • Karl K. Berggren

    Corresponding author
    1. Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, MA, USA
    • Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge MA 02139 USA

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Abstract

image

Block copolymer (BCP) thin films self-assemble to form nanoscale patterns, as K. K. Berggren and co-workers report on page 493. On a smooth substrate, the polystyrene-block-poly(dimethylsiloxane) copolymer forms randomly oriented inplane cylinders with a 35-nm period (images on the left). A set of sacrifical nanoposts made of poly(methyl methacrylate) directed the self-assembly to form (center top to bottom): square arrays of spheres or holes, and square and hexagonal meshes with bimodal hole-size distributions. The posts and the polystyrene are removed by etching and the final pattern consists of oxidized poly(dimethylsiloxane)

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