A General Route Towards Defect and Pore Engineering in Graphene (pages 2280–2284)
Guibai Xie, Rong Yang, Peng Chen, Jing Zhang, Xuezeng Tian, Shuang Wu, Jing Zhao, Meng Cheng, Wei Yang, Duoming Wang, Congli He, Xuedong Bai, Dongxia Shi and Guangyu Zhang
Version of Record online: 7 MAR 2014 | DOI: 10.1002/smll.201303671
A general route towards defect- and pore- engineering in graphene through remote plasma treatments is reported. Oxygen plasma irradiation is employed to create homogenous defects in graphene with controllable density. The created defects can be further enlarged into nanopores by hydrogen plasma anisotropic etching with well-defined pore size. The achieved smallest nanopores are ≈2 nm in size.