Integration of Thin-Film-Fracture-Based Nanowires into Microchip Fabrication (pages 2214–2221)
Seid Jebril, Mady Elbahri, Getachew Titazu, Kittitat Subannajui, Samia Essa, Florentina Niebelschütz, Claus-Christian Röhlig, Volker Cimalla, Oliver Ambacher, Bernd Schmidt, Debdulal Kabiraj, Devesh Avasti and Rainer Adelung
Article first published online: 29 OCT 2008 | DOI: 10.1002/smll.200800228
Integrated nanowires: A process for one-step device fabrication using the integration of nanowires (NWs) into silicon microchips (see image) is presented. A fracture approach enables the reproducible fabrication of NWs at desired positions between microcontact lines. The first measurements of the electrical properties of these devices suggest that they may be suitable for application in gas-sensing devices.