Laser ablation of the cell wall and localized patch clamping of the plasma membrane in the filamentous fungus Aspergillus: characterization of an anion-selective efflux channel


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We have used a pulsed u.v. laser to ablate the cell wall of the filamentous fungus Aspergillus niger van Tiegh., and expose the plasma membrane at defined points along the hypha. Using the patch clamp technique, giga ohm seals (up to 20 GΩ) and recordings of plasma membrane ion channels were obtained. We describe, for the first time in fungi, a 43 pS plasma membrane anion efflux channel. Its potential role in cell signalling and pH homeostasis is discussed.