X-ray Reflectometer for the Diagnostics of Thin Films During Growth
Journal of Applied Crystallography
Volume 30, Issue 6, pages 905–908, December 1997
How to Cite
Niggemeier, U., Lischka, K., Plotz, W. M. and Holy, V. (1997), X-ray Reflectometer for the Diagnostics of Thin Films During Growth. Jnl Applied Crystallography, 30: 905–908. doi: 10.1107/S0021889897002483
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A new experimental set-up is described that allows the measurement of the X-ray reflectivity of thin layers that are contained in a growth chamber (in situ). The X-ray reflectivity measured with our angular dispersive glancing incidence reflectometer is identical, within experimental error, to that measured with a conventional high-resolution diffractometer.