Member, American Ceramic Society.
Evaluation of Glassy Phase in Sintered Silicon Nitride by Low-Temperature Specific Heat Measurements
Article first published online: 8 MAR 2005
Journal of the American Ceramic Society
Volume 74, Issue 1, pages 244–246, January 1991
How to Cite
Watari, K., Ishizaki, K. and Mori, K. (1991), Evaluation of Glassy Phase in Sintered Silicon Nitride by Low-Temperature Specific Heat Measurements. Journal of the American Ceramic Society, 74: 244–246. doi: 10.1111/j.1151-2916.1991.tb07328.x
C. G. Pantano—contribution editor
- Issue published online: 8 MAR 2005
- Article first published online: 8 MAR 2005
- Manuscript No. 197404. Received July 31, 1990; approved October 10, 1990.
- silicon nitride;
- specific heat;
- low temperature;
The specific heat of HIP sintered Si3N4 with 3 mol% Y2O3 and 3 mol% Al2O3 additives was measured at different temperatures ranging from 2 to 10 K, in order to confirm the presence of a glassy phase in the sintered body. The grainboundary glassy phase in the sintered Si3N4 was evaluated by specific heat measurements. The difference between the experimental value and the lattice specific heat calculated from the Debye theory confirmed the existence of a glassy phase in sintered Si3N4.