Member, American Ceramic Society.
Effects of Sputtering and Plasma Etching on the Surface Reactivity of Graphite
Article first published online: 8 MAR 2005
Journal of the American Ceramic Society
Volume 76, Issue 2, pages 279–283, February 1993
How to Cite
Nowakowski, M. J., Vohs, J. M. and Bonnell, D. A. (1993), Effects of Sputtering and Plasma Etching on the Surface Reactivity of Graphite. Journal of the American Ceramic Society, 76: 279–283. doi: 10.1111/j.1151-2916.1993.tb03780.x
R. R. Reeber-contributing editor
Supported by the Air Force Office of Scientific Research, Division of Chemistry and Materials, under Grant No. AFOSR-91–0103.
Presented at the 94th Annual Meeting of the American Ceramic Society, Minneapolis, MN, April 12–16, 1992 (Basic Science Division, Paper No. 20–B–92).
- Issue published online: 8 MAR 2005
- Article first published online: 8 MAR 2005
- Manuscript No, 195698. Received May 13, 1992; approved October 19, 1992.
The surfaces of highly oriented pyrolytic graphite (HOPG) samples were treated using two different methods, exposure to an energetic oxygen ion beam and immersion in an oxygen ion plasma, and the reactions which occur during treatment were characterized using high-resolution electron energy loss spectroscopy (HREELS), temperature programmed desorption (TPD), and scanning tunneling microscopy (STM). Both surface treatments result in similar oxidation species. The results of this investigation provide spectroscopic evidence for the presence of semiquinone functionalities on sputtered and oxidized HOPG. STM images are presented to quantify the increase in defect sites after oxygen ion sputtering and to correlate defect site density with reactivity.