*Member, American Ceramic Society.
Nanostructuring of Laser-Deposited Ti Films by Self-Limited Oxidation
Article first published online: 20 JAN 2005
Journal of the American Ceramic Society
Volume 80, Issue 7, pages 1663–1667, July 1997
How to Cite
Gorbunov, A. A., Pompe, W., Eichler, H., Huey, B. and Bonnell, D. A. (1997), Nanostructuring of Laser-Deposited Ti Films by Self-Limited Oxidation. Journal of the American Ceramic Society, 80: 1663–1667. doi: 10.1111/j.1151-2916.1997.tb03035.x
- Issue published online: 20 JAN 2005
- Article first published online: 20 JAN 2005
- Received October 11, 1996; approved April 23, 1997
Local laser-induced oxidation of thin titanium films on glass is shown to be self-limiting due to a decrease in the absorptivity during the reaction. Taking advantage of this confinement, stable writing of transparent oxide line structures narrower than the diffraction-limited focused spot of a continuous wave Ar ion laser (500 nm) has been accomplished. The greatest optical contrast (1:10) with the highest resolution down to 165 nm was observed if the film thickness is of the order of the light absorption length in the metal.