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Hf3AlN: A Novel Layered Ternary Ceramic with Excellent Damage Tolerance

Authors

  • Fangzhi Li,

    1. Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China
    2. Graduate School of Chinese Academy of Sciences, Beijing 100039, China
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  • Bin Liu,

    1. Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China
    2. Graduate School of Chinese Academy of Sciences, Beijing 100039, China
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  • Jingyang Wang,

    1. Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China
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  • Yanchun Zhou

    Corresponding author
    1. Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China
      †Author to whom correspondence should be addressed. e-mail: yczhou@imr.ac.cn
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    • Member, The American Ceramic Society.


  • M. Cinibulk—contributing editor

  • This work was supported by the National Outstanding Young Scientist Foundation for Y. C. Zhou under Grant no. 59925208 and the Natural Science Foundation of China under Grant nos. 90403027, 50772114, and 50832008.

†Author to whom correspondence should be addressed. e-mail: yczhou@imr.ac.cn

Abstract

In this work, bulk Hf3AlN ceramic was synthesized by an in situ reaction/hot pressing method using Hf and AlN as initial materials. The reaction path during the synthesis process was investigated. Hf3AlN was found to form via the reaction of Hf and AlN above 1000°C. Furthermore, physical and mechanical properties of Hf3AlN, such as electrical conductivity, flexural strength, and elastic moduli were also characterized. Similar to typical layered ternary ceramics Ti3SiC2 and Ti3AlC2, Hf3AlN possesses metallic conductivity and excellent damage tolerance, which is also the first one of this type that has ever been reported to crystallize in an orthorhombic structure. It is believed that a typical layered crystal structure and weak interlayer bondings contribute to the damage tolerance of Hf3AlN. Moreover, the stiffness of Hf3AlN can sustain a temperature as high as 1450°C, being 250°C higher than that of Ti3AlC2, which renders it a promising high-temperature structural material.

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