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Multi-Layer Deposition and Characteristics of Nanocrystal CdS Thin Films by an In situ Chemical Reaction Process

Authors

  • Juan Chu,

    1. School of Materials Science and Engineering, Key Laboratory for Advanced Ceramics and Machining Technology of Ministry of Education, Tianjin University, Tianjin, China
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  • Zhengguo Jin,

    Corresponding author
    • School of Materials Science and Engineering, Key Laboratory for Advanced Ceramics and Machining Technology of Ministry of Education, Tianjin University, Tianjin, China
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  • Jingxia Yang,

    1. State Key Laboratory of Silicon Materials and Department of Materials Science & Engineering, Zhejiang University, Hangzhou, China
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  • Zhanglian Hong

    1. State Key Laboratory of Silicon Materials and Department of Materials Science & Engineering, Zhejiang University, Hangzhou, China
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Author to whom correspondence should be addressed. e-mail: zhgjin@tju.edu.cn

Abstract

In this work, an in situ chemical reaction deposition technique using solid cadmium precursor films as reaction source and ammonium sulfide-based solutions as anionic reaction medium was presented to deposit uniform, crack-free, densely packed nano-crystalline, hexagonal wurzite structure Cadmium sulfide (CdS) thin films. Influence of the Cd:S molar concentrations in separate cationic and anionic precursor solutions, deposition cycle numbers, and annealing treatment in Ar atmosphere on structure, morphology, film growth, chemical composition, and optical properties of the in situ chemical deposited films are investigated based on XRD, FESEM, AFM, HRTEM, EDS, SAED, and UV–Vis measurements.

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