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Sensitivity to thimerosal and photosensitivity to piroxicam
Article first published online: 11 APR 2006
DOI: 10.1111/j.1600-0536.1991.tb01696.x
1600-0536/asset/cover.gif?v=1&s=dbc3f5f5384e7cd094633414792bf89afed47532 "Contact Dermatitis")
Additional Information
How to Cite
de Castro, J. L. C., Freitas, J. P., Brandão, F. M. and Themido, R. (1991), Sensitivity to thimerosal and photosensitivity to piroxicam. Contact Dermatitis, 24: 187–192. doi: 10.1111/j.1600-0536.1991.tb01696.x
Publication History
- Issue published online: 11 APR 2006
- Article first published online: 11 APR 2006
- Accepted for publication 17 September 1990
- Abstract
- References
- Cited By
Keywords:
- piroxicam;
- thimerosal;
- thiosalicylic acid;
- L-cystcine;
- photoproducts;
- photosensitivity;
- cross-sensitivity;
- medicaments;
- allergic contact dermatitis
17 patients allergic to thimerosal. with no previous history of photosensitivity or piroxicam ingestion. 2 patients with piroxicam-induced photosensitivity, and 10 controls were patch or photopatch tested, with 1 or more of the following thimerosal, thiosalicylic acid, irradiated and non-irradiated solutions of piroxicam alone, L-cysteine alone and piroxicam plus l-cysteine, and piroxicam in petrolatum, The results of the tests supported the hypothesis that there are cross reactions between thiosalicylic acid and piroxicam, a photosensitizer. The mechanism of the cross-reactions may involve photoproduts of piroxicm and L-cysteine, as patients allergic to thiosalicylic aid, who have positive photopatch tests to piroxicam, also had positive patch tests to the irradiated solution of piroxicam plus L., cysteine.