Effect of Processing Parameters on Cerium Oxide Coating Deposition in Solution Precursor Plasma Spray

Authors

  • Virendra Singh,

    1. Plasma Nanomanufacturing Facility, Advanced Materials Processing and Analysis Center, Mechanical Materials Aerospace Eng, Nanoscience and Technology Center Eng 381, University of Central Florida, Orlando
    Current affiliation:
    1. Schlumberger, Rosharon, TX, USA
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  • Robert Draper,

    1. Plasma Nanomanufacturing Facility, Advanced Materials Processing and Analysis Center, Mechanical Materials Aerospace Eng, Nanoscience and Technology Center Eng 381, University of Central Florida, Orlando
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  • Sudipta Seal

    Corresponding author
    • Plasma Nanomanufacturing Facility, Advanced Materials Processing and Analysis Center, Mechanical Materials Aerospace Eng, Nanoscience and Technology Center Eng 381, University of Central Florida, Orlando
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Author to whom correspondence should be addressed. e-mail: sudipta.seal@ucf.edu

Abstract

Solution precursor plasma spray was used to deposit cerium oxide coating. This study is to understand the coating deposition mechanism in solution precursor plasma spray for cerium oxide using a cerium nitrate liquid precursor. This study includes the effect of various processing parameters on coating micro structure, such as plasma power, standoff distance, and solution concentration. Single scan experiments were performed to better understand the single splat formation and unpyrolyzed precursor deposition. X-ray diffraction analysis was conducted to determine average crystallite size of the coating from different concentration and formation of single phase cerium oxide formation. Detailed microstructural characterizations of the coatings were carried out by scanning electron microscopy.

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