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Mechanical Properties of Cr-Si-N-O Thin Films Deposited by RF Reactive Unbalanced Magnetron Sputtering, Jun Shirahata, Tetsutaro Ohori, Hiroki Asami, Tsuneo Suzuki, Tadachika Nakayama, Hisayuki Suematsu and Koichi Niihara. DOI: 10.1002/9780470944066.ch2

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