Marcin Sieniek and Maciej Paszynski Subtree Reuse in Multi-Frontal Solvers for Regular Grids in Step-and-Flash Imprint Nanolithography Modeling Advanced Engineering Materials 16
The paper presents multi-scale modeling of the step-and-flash imprint lithography, a modern patterning process. The internal part is modeled with finite elements while the outer part uses a more precise particle model. In order to improve the performance of software modeling of the finite element part of the domain, we propose an optimization technique for multi-frontal direct solvers with constant coefficients. The technique consists in reuse of sub-branches of elimination trees over regular cube-shaped grids built with hexahedral finite elements.
Complete the form below and we will send an e-mail message containing a link to the selected article on your behalf