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Marcin Sieniek and Maciej Paszynski Subtree Reuse in Multi-Frontal Solvers for Regular Grids in Step-and-Flash Imprint Nanolithography Modeling Advanced Engineering Materials 16

Article first published online: 14 OCT 2013 | DOI: 10.1002/adem.201300267

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The paper presents multi-scale modeling of the step-and-flash imprint lithography, a modern patterning process. The internal part is modeled with finite elements while the outer part uses a more precise particle model. In order to improve the performance of software modeling of the finite element part of the domain, we propose an optimization technique for multi-frontal direct solvers with constant coefficients. The technique consists in reuse of sub-branches of elimination trees over regular cube-shaped grids built with hexahedral finite elements.

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