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Seungwoo Lee, Hong Suk Kang and Jung-Ki Park High-Resolution Patterning of Various Large-Area, Highly Ordered Structural Motifs by Directional Photofluidization Lithography: Sub-30-nm Line, Ellipsoid, Rectangle, and Circle Arrays Advanced Functional Materials 21

Version of Record online: 15 MAR 2011 | DOI: 10.1002/adfm.201001927

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Directional photofluidization of azopolymers allows one to fabricate large-area nanoscale motifs with precisely controlled structural features including sizes, shapes, and orientations. Additionally, this approach can offer good control of the final feature size, and the fluidic behavior of the azopolymer under light irradiation reduces the line-edge roughness, thus improving the quality of nanostructures.

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