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Sabrina Niesar, Rui N. Pereira, Andre R. Stegner, Nadine Erhard, Marco Hoeb, Andrea Baumer, Hartmut Wiggers, Martin S. Brandt and Martin Stutzmann Low-Cost Post-Growth Treatments of Crystalline Silicon Nanoparticles Improving Surface and Electronic Properties Advanced Functional Materials 22

Version of Record online: 23 JAN 2012 | DOI: 10.1002/adfm.201101811

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For crystalline silicon nanoparticles (Si-ncs), various low-cost post-growth treatments are presented that efficiently reduce the number of charge-trapping defects in the Si-ncs and remove the native oxide that forms upon exposure to air and hinders the charge transport. Particularly promising are HF-etched plus vacuum annealed Si-ncs leading to a strong conductivity enhancement in thin films and HF-etched plus hydrosilylated Si-ncs that are extremely stable against reoxidation.

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