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Audrey M. Bowen, Michael J. Motala, J. Matthew Lucas, Sidhartha Gupta, Alfred J. Baca, Agustin Mihi, A. Paul Alivisatos, Paul V. Braun and Ralph G. Nuzzo Triangular Elastomeric Stamps for Optical Applications: Near-Field Phase Shift Photolithography, 3D Proximity Field Patterning, Embossed Antireflective Coatings, and SERS Sensing Advanced Functional Materials 22

Version of Record online: 12 APR 2012 | DOI: 10.1002/adfm.201102455

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A decal transfer lithography technique is used to fabricate elastomeric stamps with triangular cross sections. These stamps, which contain triangular prisms or cones, are used in several prototypical optical applications that illustrate the utility of triangular poly(dimethylsiloxane) decals for manipulating light–matter interactions in a predictable and controllable manner.

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