Cristina Martin-Olmos, L. Guillermo Villanueva, Peter D. van der Wal, Andreu Llobera, Nico F. de Rooij, Jürgen Brugger and Francesc Perez-Murano Conductivity of SU-8 Thin Films through Atomic Force Microscopy Nano-Patterning Advanced Functional Materials 22
Atomic force microscopy (AFM)-based lithography of SU-8 ultrathin films and its applicability for the fabrication of nano-devices are investigated. It is shown that SU-8 presents outstanding insulating properties and extremely high dielectric strength. A physical-chemical mechanism responsible for the AFM-based patterning is proposed and the potential of this AFM nanopatterning demonstrated by the pro-totyping and testing of nanoelectrode arrays.
Complete the form below and we will send an e-mail message containing a link to the selected article on your behalf