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Cristina Martin-Olmos, L. Guillermo Villanueva, Peter D. van der Wal, Andreu Llobera, Nico F. de Rooij, Jürgen Brugger and Francesc Perez-Murano Conductivity of SU-8 Thin Films through Atomic Force Microscopy Nano-Patterning Advanced Functional Materials 22

Version of Record online: 27 JAN 2012 | DOI: 10.1002/adfm.201102789

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Atomic force microscopy (AFM)-based lithography of SU-8 ultrathin films and its applicability for the fabrication of nano-devices are investigated. It is shown that SU-8 presents outstanding insulating properties and extremely high dielectric strength. A physical-chemical mechanism responsible for the AFM-based patterning is proposed and the potential of this AFM nanopatterning demonstrated by the pro-totyping and testing of nanoelectrode arrays.

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