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Dattatray J. Late, Bin Liu, H. S. S. Ramakrishna Matte, C. N. R. Rao and Vinayak P. Dravid Rapid Characterization of Ultrathin Layers of Chalcogenides on SiO2/Si Substrates Advanced Functional Materials 22

Version of Record online: 16 FEB 2012 | DOI: 10.1002/adfm.201102913

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Preparation, isolation, and rapid unambiguous characterization of large size ultrathin layers of MoS2, GaS, and GaSe onto SiO2/Si substrates is reported. The optical contrast of these thin layers is correlated with atomic force microscopy (AFM), Raman spectroscopy, and Raman imaging to determine the exact thickness and to calculate number of atomic layers present in the thin flakes/sheets in a fast, non-destructive, and unambiguous manner.

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