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Tristan Kolb, Christian Neuber, Marie Krysak, Christopher K. Ober and Hans-Werner Schmidt Multicomponent Physical Vapor Deposited Films with Homogeneous Molecular Material Distribution Featuring Improved Resist Sensitivity Advanced Functional Materials 22

Version of Record online: 25 MAY 2012 | DOI: 10.1002/adfm.201103130

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The homogeneous molecular material distribution of a multicomponent molecular glass electron beam resist is systematically investigated for solvent-based spin-coated and solvent-free physical vapor deposited thin films. The applied screening methods and combinatorial optimizations allow the investigation of dissolution behavior, resist sensitivity, and overall lithographic performance demonstrating the advantages of applying physical vapor deposition for film preparation.

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