E-mail

E-mail a Wiley Online Library Link

Tristan Kolb, Christian Neuber, Marie Krysak, Christopher K. Ober and Hans-Werner Schmidt Multicomponent Physical Vapor Deposited Films with Homogeneous Molecular Material Distribution Featuring Improved Resist Sensitivity Advanced Functional Materials 22

Version of Record online: 25 MAY 2012 | DOI: 10.1002/adfm.201103130

Thumbnail image of graphical abstract

The homogeneous molecular material distribution of a multicomponent molecular glass electron beam resist is systematically investigated for solvent-based spin-coated and solvent-free physical vapor deposited thin films. The applied screening methods and combinatorial optimizations allow the investigation of dissolution behavior, resist sensitivity, and overall lithographic performance demonstrating the advantages of applying physical vapor deposition for film preparation.

Complete the form below and we will send an e-mail message containing a link to the selected article on your behalf

Required = Required Field

SEARCH