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Seungwoo Lee, Hong Suk Kang and Jung-Ki Park NANOARCHITECTURES: High-Resolution Patterning of Various Large-Area, Highly Ordered Structural Motifs by Directional Photofluidization Lithography: Sub-30-nm Line, Ellipsoid, Rectangle, and Circle Arrays (Adv. Funct. Mater. 10/2011) Advanced Functional Materials 21

Article first published online: 16 MAY 2011 | DOI: 10.1002/adfm.201190034

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A principal challenge in nanopatterning is to beat the resolution limit of established methods. On page 1770, Seungwoo Lee, Hong Suk Kang, and Jung-Ki Park present the directional photofluidization of azopolymers, which allows the generation of large-area, highly ordered nanoarchitectures with precisely controlled structural features. Additionally, this approach can offer unprecedented flexibility in control of the final feature size, and, simultaneously, its fluidic behavior under light irradiation signifi cantly reduces the line-edge roughness

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