Ya-Mi Chuang, Kevin S. Jack, Han-Hao Cheng, Andrew K. Whittaker and Idriss Blakey Using Directed Self Assembly of Block Copolymer Nanostructures to Modulate Nanoscale Surface Roughness: Towards a Novel Lithographic Process Advanced Functional Materials 23
A novel process is developed to modulate the nanometer-scale roughness of surfaces. This is achieved through the directed self assembly of positively charged polymersomes, composed of block copolymers, onto negatively charged surfaces, which is followed by an annealing step that allows the selective reflow of the block copolymer to reduce the nanoscale surface roughness. The application of this method to smooth lithographically produced features is demonstrated.
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