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Hong Liu, Bing Wang, Lin Ke, Jie Deng, Chan Chum Choy, Ming Sheng Zhang, Lu Shen, Stefan A. Maier and Jing Hua Teng High Contrast Superlens Lithography Engineered by Loss Reduction Advanced Functional Materials 22

Version of Record online: 23 MAY 2012 | DOI: 10.1002/adfm.201200788

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Sub-diffraction-limited resolution and high contrast thin flat silver superlenses (Ag, Ag/Ni and Ag/Ge) are engineered through refining interfacial roughness to reduce scattering loss. A smooth interface is a key factor for realizing high performance superlens lithography while the seed layer effect is detrimental. This report verifies that a superlens is a potential tool for nano-photolithography.

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