E-mail

E-mail a Wiley Online Library Link

Hong Liu, Bing Wang, Lin Ke, Jie Deng, Chan Chum Choy, Ming Sheng Zhang, Lu Shen, Stefan A. Maier and Jing Hua Teng High Contrast Superlens Lithography Engineered by Loss Reduction Advanced Functional Materials 22

Version of Record online: 23 MAY 2012 | DOI: 10.1002/adfm.201200788

Thumbnail image of graphical abstract

Sub-diffraction-limited resolution and high contrast thin flat silver superlenses (Ag, Ag/Ni and Ag/Ge) are engineered through refining interfacial roughness to reduce scattering loss. A smooth interface is a key factor for realizing high performance superlens lithography while the seed layer effect is detrimental. This report verifies that a superlens is a potential tool for nano-photolithography.

Complete the form below and we will send an e-mail message containing a link to the selected article on your behalf

Required = Required Field

SEARCH