E-mail

E-mail a Wiley Online Library Link

Andreas C. Fischer, Lyubov M. Belova, Yuri G. M. Rikers, B. Gunnar Malm, Henry H. Radamson, Mohammadreza Kolahdouz, Kristinn B. Gylfason, Göran Stemme and Frank Niklaus 3D Free-Form Patterning of Silicon by Ion Implantation, Silicon Deposition, and Selective Silicon Etching Advanced Functional Materials 22

Article first published online: 8 JUN 2012 | DOI: 10.1002/adfm.201200845

Thumbnail image of graphical abstract

A method for additive layer-by-layer fabrication of 3D Si micro- and nanostructures is reported. The fabrication is based on alternating chemical vapor deposition of Si and local implantation of gallium ions by focused ion beam (FIB) writing. In a final step, the defined 3D structures are formed by etching the silicon in KOH, in which the local ion implantation provides the etching selectivity.

Complete the form below and we will send an e-mail message containing a link to the selected article on your behalf

Required = Required Field

Choose captcha format: Image or Audio. Click here if you need help.

SEARCH