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Ishan Wathuthanthri, Yuyang Liu, Ke Du, Wei Xu and Chang-Hwan Choi Simple Holographic Patterning for High-Aspect-Ratio Three-Dimensional Nanostructures with Large Coverage Area Advanced Functional Materials 23

Version of Record online: 7 SEP 2012 | DOI: 10.1002/adfm.201201814

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High-aspect-ratio three-dimensional photoresist nanostructures are fabricated with simple two-beam holography that relies on the novel use of vertical standing wave phenomena. The nanostructures, with a large pattern coverage area, are employed for various additive and subtractive pattern transfer processes, such as etching, deposition, and molding, for potential applications as photonic crystals, in photovoltaic solar cells, and as photocatalysts in water decontamination.

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