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Shagufta Naureen, Naeem Shahid, Reza Sanatinia and Srinivasan Anand Top-Down Fabrication of High Quality III–V Nanostructures by Monolayer Controlled Sculpting and Simultaneous Passivation Advanced Functional Materials 23

Article first published online: 26 OCT 2012 | DOI: 10.1002/adfm.201202201

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A novel post etch chemical process is developed to etch III–V materials with monolayer precision in an inverse epitaxial manner. The process, which also simultaneously passivates the surface, is applied to push the limits of top-down fabrication. InP-based high-optical quality nanowire arrays with aspect ratios more than 50 and nanostructures with new topologies are demonstrated.

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