E-mail a Wiley Online Library Link

Justin R. Sparks, Rongrui He, Noel Healy, Subhasis Chaudhuri, Thomas C. Fitzgibbons, Anna C. Peacock, Pier J. A. Sazio and John V. Badding Conformal Coating by High Pressure Chemical Deposition for Patterned Microwires of II–VI Semiconductors Advanced Functional Materials 23

Article first published online: 30 OCT 2012 | DOI: 10.1002/adfm.201202224

Thumbnail image of graphical abstract

High pressure chemical vapor deposition can deposit conformal films of II–VI semiconductors such as ZnSe, ZnS, and ZnO into very high aspect ratio pores. This process allows for II–VI semiconductors, which cannot be processed into optical fibers with conventional techniques, to be fabricated into step index and microstructured optical fibers.

Complete the form below and we will send an e-mail message containing a link to the selected article on your behalf

Required = Required Field