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Justin R. Sparks, Rongrui He, Noel Healy, Subhasis Chaudhuri, Thomas C. Fitzgibbons, Anna C. Peacock, Pier J. A. Sazio and John V. Badding Conformal Coating by High Pressure Chemical Deposition for Patterned Microwires of II–VI Semiconductors Advanced Functional Materials 23

Version of Record online: 30 OCT 2012 | DOI: 10.1002/adfm.201202224

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High pressure chemical vapor deposition can deposit conformal films of II–VI semiconductors such as ZnSe, ZnS, and ZnO into very high aspect ratio pores. This process allows for II–VI semiconductors, which cannot be processed into optical fibers with conventional techniques, to be fabricated into step index and microstructured optical fibers.

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