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Andreas C. Fischer, Lyubov M. Belova, Yuri G. M. Rikers, B. Gunnar Malm, Henry H. Radamson, Mohammadreza Kolahdouz, Kristinn B. Gylfason, Göran Stemme and Frank Niklaus 3D Patterning: 3D Free-Form Patterning of Silicon by Ion Implantation, Silicon Deposition, and Selective Silicon Etching (Adv. Funct. Mater. 19/2012) Advanced Functional Materials 22

Version of Record online: 2 OCT 2012 | DOI: 10.1002/adfm.201290115

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On page 4004, Frank Niklaus and co-workers report on the fabrication of 3D nanostructures by alternating steps of silicon deposition and local ion implantation by focused ion beam (FIB) writing. The defined 3D nanostructures are formed in a final step by selective silicon etching.

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