Kenji Okada, Yasuaki Tokudome, Rie Makiura, Kristina Konstas, Luca Malfatti, Plinio Innocenzi, Hiroki Ogawa, Toshiji Kanaya, Paolo Falcaro and Masahide Takahashi Micropattern Formation by Molecular Migration via UV-induced Dehydration of Block Copolymers Advanced Functional Materials 24
Article first published online: 23 JAN 2014 | DOI: 10.1002/adfm.201302812
A novel UV-induced fabrication of nano/macro hierarchical structures of triblock copolymer lamellar films is developed. The method is based on a change in the water affinity of the films activated by UV light. Osmotic pressure at the interface between illuminated and unilluminated parts drives the molecular migration for surface pattern formation. This remarkable advantage makes this method exceptionally versatile.
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