M.-J. Lee, S. Seo, D.-C. Kim, S.-E. Ahn, D. H. Seo, I.-K. Yoo, I.-G. Baek, D.-S. Kim, I.-S. Byun, S.-H. Kim, I.-R. Hwang, J.-S. Kim, S.-H. Jeon and B. H. Park A Low-Temperature-Grown Oxide Diode as a New Switch Element for High-Density, Nonvolatile Memories Advanced Materials 19
A one-diode/one-resistor structure, Pt/NiO/Pt/p-NiOx/n-TiOx/Pt, has been fabricated. This novel structure exhibits bistable resistance switching under forward bias, while the diode suppresses resistance switching in the Pt/NiO/Pt memory cell under reverse bias (see figure). Its low processing temperature and small cell size, as well as excellent rectifying characteristics, make this Pt/p-NiOx/n-TiOx/Pt diode structure a promising switch element for high- density, nonvolatile memory devices with 3D stack and cross-point structures.
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