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Mahriah E. Alf, Ayse Asatekin, Miles C. Barr, Salmaan H. Baxamusa, Hitesh Chelawat, Gozde Ozaydin-Ince, Christy D. Petruczok, Ramaswamy Sreenivasan, Wyatt E. Tenhaeff, Nathan J. Trujillo, Sreeram Vaddiraju, Jingjing Xu and Karen K. Gleason Chemical Vapor Deposition of Conformal, Functional, and Responsive Polymer Films Advanced Materials 22

Version of Record online: 4 DEC 2009 | DOI: 10.1002/adma.200902765

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Chemical vapor deposition (CVD) polymerization bridges all-dry microfabrication technology with the chemistry of functional and responsive organic materials. In a single step, vapor-phase monomers can be transformed through selective reaction for surface modification of micro- and nanostructured surfaces. Shown is conformal CVD polymer deposition, ∼350 nm thick, on trenches 7 μm deep and 2 μm wide etched on silicon.

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