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Jeong-Hyun Cho, Teena James and David H. Gracias Curving Nanostructures Using Extrinsic Stress Advanced Materials 22

Article first published online: 7 APR 2010 | DOI: 10.1002/adma.200904410

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We demonstrate the concept of inducing stresses in thin films post-deposition (extrinsic stress) to curve nanostructures on demand. The remarkably high extrinsic stress, induced by triggering grain coalescence in Sn thin films, was used to self]assemble 3D nanostructures with radii of curvature as small as 20 nm. The fabrication methodology required only simple processing steps and the self]assembly process was highly parallel. Curved nanostructures with any desired pattern and both homogeneous (rings, tubes) and variable radii of curvature (spirals, talons) could be constructed.

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