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John M. Nagarah, Eunsu Paek, Yi Luo, Pin Wang, Gyeong S. Hwang and James R. Heath Batch Fabrication of High-Performance Planar Patch-Clamp Devices in Quartz Advanced Materials 22

Article first published online: 9 SEP 2010 | DOI: 10.1002/adma.201001793

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The success of the patch-clamp technique has driven an effort to create wafer-based patch-clamp platforms. We develop a lithographic/electrochemical processing scheme that generates ultrasmooth, high aspect ratio pores in quartz. These devices achieve gigaohm seals in nearly 80% of trials, with the majority exhibiting seal resistances from 20-80 GΩ, competing with pipette-based patch-clamp measurements.

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