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Jae Chul Park, Sangwook Kim, Sunil Kim, Changjung Kim, Ihun Song, Youngsoo Park, U-In Jung, Dae Hwan Kim and Jang-Sik Lee Highly Stable Transparent Amorphous Oxide Semiconductor Thin-Film Transistors Having Double-Stacked Active Layers Advanced Materials 22

Article first published online: 22 OCT 2010 | DOI: 10.1002/adma.201002397

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A novel device structure is presented for amorphous oxide semiconductor thin-film transistors with high performance as well as improved electrical/optical stress stability. The highly stable transistor devices are developed using composition-modulated dual active layers. This approach could potentially be used to fabricate product-level display devices using amorphous oxide semiconductors in the near future.

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