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Simona C. Laza, Marco Polo, Antonio A. R. Neves, Roberto Cingolani, Andrea Camposeo and Dario Pisignano Two-Photon Continuous Flow Lithography Advanced Materials 24

Version of Record online: 3 FEB 2012 | DOI: 10.1002/adma.201103357

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A new approach for microfluidics-based production of polymeric particles, namely two-photon continuous flow lithography, is reported. This technique takes advantage of two-photon lithography to create objects with sub-micrometer and 3D features, and overcomes the traditional process limitations of two-photon lithography by using multiple beam production under continuous flow. Polymeric fibers, helical and bow-tie particles with sub-diffraction resolution and surface roughness as low as 10 nm are demonstrated.

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