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Joachim Fischer and Martin Wegener Ultrafast Polymerization Inhibition by Stimulated Emission Depletion for Three-dimensional Nanolithography Advanced Materials 24

Version of Record online: 10 FEB 2012 | DOI: 10.1002/adma.201103758

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To identify the depletion mechanism in the stimulated-emission-depletion (STED) inspired photoresist composed of a ketocoumarin photoinitiator in pentaerythritol tetraacrylate, we perform lithography with pulsed excitation and tunable delayed depletion. A fast component can unambiguously be assigned to stimulated emission. Our results allow the systematical optimization of the conditions in next-generation STED direct-laser-writing optical lithography.

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