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Hyeon Su Jeong, Yun Ho Kim, Ji Sun Lee, Jung Hyun Kim, Mohan Srinivasarao and Hee-Tae Jung Chiral Nematic Fluids as Masks for Lithography Advanced Materials 24

Article first published online: 13 DEC 2011 | DOI: 10.1002/adma.201103817

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A lithographic scheme is reported that uses a cholesteric liquid crystal with its helical axis in the plane of the sample as a “mask” for imprinting patterns in a photoresist over a large area. On the application of an electric field the cholesteric liquid crystals produce a texture that acts as a lattice of cylindrical lenses for one polarization of a light beam. This is used in photolithography to create parallel lines over large areas.

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