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Catherine Marichy, Mikhael Bechelany and Nicola Pinna Atomic Layer Deposition of Nanostructured Materials for Energy and Environmental Applications Advanced Materials 24

Version of Record online: 26 JAN 2012 | DOI: 10.1002/adma.201104129

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Atomic layer deposition (ALD) is a thin film technology that in the past two decades rapidly developed from a niche technology to an established method. It has proven to be a key technology for the surface modification and the fabrication of complex nanostructured materials for energy and environmental applications. Figure reproduced with permission from [5].

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