Catherine Marichy, Mikhael Bechelany and Nicola Pinna Atomic Layer Deposition of Nanostructured Materials for Energy and Environmental Applications Advanced Materials 24
Atomic layer deposition (ALD) is a thin film technology that in the past two decades rapidly developed from a niche technology to an established method. It has proven to be a key technology for the surface modification and the fabrication of complex nanostructured materials for energy and environmental applications. Figure reproduced with permission from .
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